Electron Beam Evaporation System

Atc e and atc orion 8e cylindrical uhv style chambers and atc 2030 and atc 2036 hv style box coaters.

Electron beam evaporation system.

The generated electron beam is accelerated to a high kinetic energy and directed towards the evaporation material. Pellets of au and vaporize it within a vacuum environment. The e beam system has the following features. A compact vertical dual chamber configuration features a 14 cube main chamber where the platen is located and underneath the main chamber a secondary chamber is provided for housing the e beam source.

Electron beam e beam evaporation is a time tested deposition technology for producing dense high purity coatings. Aja international atc e series electron beam evaporation systems are available in the following versions. This configuration can be provided with a gate valve between the two chambers to be used as a load lock to keep the e beam source and the evaporation pockets in vacuum while substrates are loaded and unloaded. The kinetic energy of the electrons is converted into other forms of energy through interactions with the evaporation material.

E beam evaporation is a physical vapor deposition pvd technique whereby an intense electron beam is generated from a filament and steered via electric and magnetic fields to strike source material e g. Electron beam evaporation or e beam evaporation is a powerful physical vapor deposition process that allows the user to evaporate materials that are difficult or even impossible to process using standard resistive thermal evaporation. The electron beam evaporation system is available in two different configurations. These systems can contain single or multiple thermal sources multi pocket e beam sources and multi gun sources as required.

Pvd products complete thermal and electron beam evaporation systems are designed to meet the customer s specific deposition needs. High voltage is applied between the filament and the hearth to accelerate these liberated electrons towards the crucible containing the material to be deposited. Our evaporation systems come complete with power supplies sweep controls and quartz crystal deposition rate monitors for closed loop feedback control. Linear e beam sources are also available.

Some of these materials include high temperature materials such as gold used as an electrical contact in solar cell applications or ceramics like silicon dioxide for optical films among many others. E beam evaporation provides for the direct transfer of a larger amount of energy into the source material enabling the evaporation of metal and dielectric materials with very high melting temperatures such as gold and silicon dioxide respectively. Upon striking the evaporation material the electrons will lose their energy very rapidly. During an e beam evaporation process current is first passed through a tungsten filament which leads to joule heating and electron emission.

Ferrotec offers a complete line of electron beam evaporation components ranging from the temescal e beam guns with a rich history that goes back to the first e gun design patents to our unique center mount guns with an integrated feedthrough that puts all connections outside of the vacuum.